Brian K. Long

Assistant Professor - Department of Chemistry

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Dr. Brian Long began studying chemistry as an undergraduate at North Georgia College & State University and as a REU student at Furman University. After completion of his bachelor’s degree, he attended the University of Texas at Austin for his doctoral studies with Professors C. Grant Willson and Christopher W. Bielawski. His research there involved the synthesis and application of traditional and nontraditional resist chemistries as well as nonlinear optical materials. After graduating in 2009, he moved to Ithaca, NY to begin his postdoctoral studies at Cornell University under the supervision of Professor Geoffrey W. Coates. While at Cornell, Dr. Long focused on the design, synthesis and application of olefin polymerization catalysts. He has since returned to the southeast and is currently an Assistant Professor of Chemistry at the University of Tennessee.

Focus Areas: Macromolecular Chemistry | Organic Synthesis | Catalysis and Catalyst Design | Tailored Polymers

Skills and Expertise: Multi-Step Synthesis | Functional Materials and Polymers | Organometallic Synthesis

Selected Publications:

Synthesis and Characterization of Norboranediol Isomers and Their Fluorinated Analogues
Grayson, S. M.; Long, B. K.; Kusomoto, S.; Osborn, B. P.; Callahan, R. P.; Chambers, C. R.; Willson, C. G., , The Journal of Organic Chemistry, vol. 71, pp. 341-344, 2006.
Materials for Step and Flash Imprint Lithography (S-FIL®)
Long, B. K.; Keitz, B. K.; Willson, C. G, Journal of Materials Chemistry, vol. 17, pp. 3575-3580, 2007.
Design of Reversible Cross-Linkers for Step and Flash Imprint Lithography Imprint Resists
Palmieri, F.; Adams, J.; Long, B. K.; Heath, W.; Tsiartas, P.; Willson, C. G, CS Nano, vol. 1, no. 4, pp. 307-312, 2007.
Near-Surface Modification of Polystyrene by Ar+: Molecular Dynamics Simulations and Experimental Validation
Végh, J. J.; Nest, D.; Graves, D. B.; Bruce, R.; Engelmann, S.; Kwon, T.; Phaneuf, R.; Oehrlein, G. S.; Long, B. K.; Willson, C, Applied Physics Letters, vol. 91, no. 23, 2007.
Degradable Cross-Linkers and Strippable Imaging Materials for Step-and-Flash Imprint Lithography
Heath, W. H.; Palmieri, F.; Adams, J. R.; Long, B. K.; Chute, J.; Holcombe, T.; Zieren, S.; Truitt, M. J.; White, J. L.; Willson, C. G., , Macromolecules , vol. 41, no. 3, pp. 719-726, 2008.
Investigation of Plasma-Polymer Interactions for Patterning Nanostructures
Bruce, R. L.; Engelmann, S.; Lin, T.; Kwon, T.; Phaneuf, R.; Oehrlein, G. S.; Long, B. K.; Willson, C.; Végh, J.; Nest, D.; Graves, D. B.; Alizadeh, A, Journal of Vacuum Science & Technology B, vol. 27, 2009.
Fundamental Optical Properties of Linear and Cyclic Alkanes: VUV Absorbance and Index of Refraction
Costner, E.; Long, B. K.; Navar, C.; Jockusch, S.; Lei, X.; Zimmerman, P.; Campion, A.; Turro, N.; Willson, C. G, The Journal of Physical Chemistry, vol. 113, no. 33, pp. 9337-9347, 2009.
Relationship Between Nanoscale Roughness and Ion-damaged Layer in Argon Plasma Exposed Polystyrene Films
Bruce, R. L.; Weilnboeck, F.; Lin, T.; Phaneuf, R. J.; Oehrlein, G. S.; Long, B. K.; Willson, C. G.; Vegh, J. J.; Nest, D.; Graves, D. B., , Journal of Applied Physics, vol. 107, no. 8, 2010.
Molecular Structure Effects on Dry Etching Behavior of Si-containing Resists in Oxygen Plasma
Bruce, R. L.; Lin, T.; Phaneuf, R. J.; Oehrlein, G. S.; Bell, W.; Long, B.; Willson C. G., , Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 28, no. 4, pp. 751-757, 2010.
On the Absence of Post-plasma Etch Surface and Line Edge Roughness in Vinylpyridine Resists
Bruce, R. L.; Weilnboeck, F.; Lin, T.; Phaneuf, R. J.; Oehrlein, G. S.; Long, B. K.; Willson C. G.; Alizadeh, A., , Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures, vol. 29, no. 4, pp. , 2011.